Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering
نویسندگان
چکیده
منابع مشابه
Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering
Film growth rates during DCMS and HIPIMS sputtering in Ar are measured for ten technologically-relevant elemental target materials: Al, Si, Ti, Cr, Y, Zr, Nb, Hf, Ta, and W, spanning wide range of masses, ionization energies, and sputter yields. Surprisingly, the ratio of power-normalized HIPIMS and DCMS rates α decays exponentially with increasing peak target current density JJTT for all metal...
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The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared to direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target, due to a substantial negative potential profile from the location of ionization towards the cathode. Emitting and swept L...
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A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process conditions at a given set point, a feedback control system was implemented that automatically regulates th...
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ژورنال
عنوان ژورنال: Vacuum
سال: 2016
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2015.11.004